I. Equipment Overview:

It is mainly used in the polycrystalline synthesis process of 3-6 inch indium phosphide and gallium phosphide III-V compound semiconductor crystal materials, and in automatic control systems.

II. Equipment Parameter Types:

III. Main Features and Advantages of the Equipment

1★ It has powerful operating functions, a Windows interface, and a display screen, allowing users to easily modify process control parameters and display various process statuses at any time; it is equipped with fault self-diagnosis software, which can greatly save maintenance time.

2★ Adopting a highly reliable industrial computer + PLC mode, it performs fully automatic control of furnace temperature, gas flow, valves, etc., realizing the automation of the entire process;

3★ The program can operate manually or automatically. After a power outage or a mid-process stop, it can be restarted manually to raise the temperature according to the process, saving process time.

4★ The gas flow rate is precisely controlled by a high-pressure valve, and closed-loop control is adopted using analog signals. Strong and weak electrical circuits are separated, and the gas opening has a soft start function.

5★ Features multiple alarm functions and safety protection functions;
6★ Automatic temperature control zone adjustment accurately controls the actual process temperature of the reaction tube;